Experimental/Research Mask Aligner ES410
A mask aligner with sufficient functionality for photolithography at a low cost.
The ES410 mask aligner for experiments and research is a low-cost device that possesses sufficient functions necessary for photolithography. It is a fully manual machine suitable for various experiments, research, and learning about photolithography. With the wide customization options unique to the ES series, it can be set up to better fit specific purposes by selecting various units and options. Most units can be added or changed later, allowing for future upgrades. For more details, please contact us or refer to the catalog.
- Company：ナノテック
- Price：Other
